Coating Design Archives - Shanghai Optics https://www.shanghai-optics.com/category/coating-design/ Your Custom Optics Experts Thu, 29 Jan 2026 12:23:28 +0000 en-US hourly 1 https://wordpress.org/?v=7.0.4 https://www.shanghai-optics.com/wp-content/uploads/2025/06/favicon-96x96.png Coating Design Archives - Shanghai Optics https://www.shanghai-optics.com/category/coating-design/ 32 32 Beamsplitter Coatings https://www.shanghai-optics.com/optical-system-lens-assembly/coating-design/beamsplitter-coatings/ Mon, 30 Jun 2025 05:16:30 +0000 https://shanghai-optics.com/?page_id=376 Beamsplitter Coatings 45°Beamsplitter Substrate: fused silica, BK7 Surface Figure: <λ/10 @ 632.8nm Surface Quality: 40-20 Chamfer: 0.5mm, 45° Coating Material: Electron beam deposited dielectric: multi-layers Incident: 0°,45° Laser-Induced Damage Threshold:

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Beamsplitter Coatings

45°Beamsplitter

Substrate: fused silica, BK7

Surface Figure: <λ/10 @ 632.8nm

Surface Quality: 40-20

Chamfer: 0.5mm, 45°

Coating Material: Electron beam deposited dielectric: multi-layers

Incident: 0°,45°

Laser-Induced Damage Threshold: >5J/cm2 (1.06μm,1ns)

Incident Angle Wavelength (nm) Separating Tolerance
Tave/Rave Tp/Rp Tp/Rp
45° 510-500 50/50 ±3%
45° 780 50/50 ±3%
45° 632.8 50/50 ±3%

Dichroic Beamsplitter

Substrate: fused silica, BK7

Surface Figure: <λ/10 @ 632.8nm

Surface Quality: 40-20

Chamfer: 0.5mm, 45°

Coating Material: Electron beam deposited dielectric: multi-layers

Incident: 0°,

Laser-Induced Damage Threshold: >5J/cm2 (1.06μm,1ns)

Incident AngleTWavelength (nm)TransmissionRWavelengthReflectance
0°808>90%946>99.5%
0°808>90%1064>99.5%
0°808>90%1320>99.5%
0°940>90%1030>99.5%

Polarizing Beamsplitter Cubes

Substrate fused: silica, BK7

Surface Figure: <λ/10 @ 632.8nm

Surface Quality: 40-20

Chamfer: 0.5mm, 45°

Coating Material: Electron beam deposited dielectric: multi-layers

Incident:0°±2°

Polarizing: Tp≥98%; Ts≤0.2%

Extinction Ratio: Tp:Ts>500:1

AR Coating: R<0.25%

Wavelength (nm)
632.8
780
830
852
1064
1310
1550
420-470

 

Polarizing Beamsplitter Plates

Substrate fused: silica, BK7

Surface Figure: <λ/10 @ 632.8nm

Surface Quality: 40-20

Chamfer: 0.5mm, 45°

Coating Material: Electron beam deposited dielectric multi-layers

Imcident Angle: 56.6°±3°

Polarizing: Tp≥96%; Ts≤1%

Extinction Ratio: Tp:Ts>100:1

Wavelength Range: Visible, Near Infrared

Wavelength (nm)Wavelength (nm)
20/25.4/30780
20/25.4/301064
20/25.4/301310
20/25.4/301550

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]]> Infrared Coatings https://www.shanghai-optics.com/optical-system-lens-assembly/coating-design/infrared-coatings/ Mon, 30 Jun 2025 05:16:16 +0000 https://shanghai-optics.com/?page_id=371 Infrared Coatings IR coatings at here mean coatings for infrared region in 2.5μm(2500nm)-16μm. There is a big difference in selection of materials and fabrication techniques between IR coatings and near

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Infrared Coatings

IR coatings at here mean coatings for infrared region in 2.5μm(2500nm)-16μm. There is a big difference in selection of materials and fabrication techniques between IR coatings and near infrared coatings. They are mainly used in industrial and medical laser equipments such as CO2 laser, Er:YAG laser, CO and HF lasers.

High energy CO2 laser coatings (10.6μm)

>ZnSe/GaAs lens

AR R<0.2% note: Ge use low energy laser>ZnSe/GaAs Windows

PR/HT 20%-98%/T>99%note: Ge use low energy laser>Si/Cu substrate total Reflectors

Enhanced Au/Ag Reflectors R>99.5% note: BK7 substrate use low energy laser

Er:YAG Coatings (2.94μm)

>CaF2/Sapphire Crystal lens

AR/AR R<0.2%>CaF2/Sapphire Crystal Windows

PR/AR 20%-98%/R < 0.2% > BK7/CaF2/Sapphire Substrate mirror

HR R>99%

Infrared Imaging system

>Silicon Lens：AR/AR T>98% 3.5-5μm

T>60% 7.5-11.5μm
note: Oxide Free Si has high absorbtion in 7.5-11.5μm, but the materials is very cheap, so it can use Infrared Imaging System instead of Ge/ZnS/ZnSe materials.>MgF2 Windows

AR/AR 3.5-4.8μm T>95%>ZnSe/ZnS/Ge Substrate Lens：AR/AR

T>98% 3.5-5.5μm

T>97% 7.5-11.5μm

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