Anti-Reflection (AR) coating is one of widely used optical thin-film coatings that can be applied to the surfaces of optical elements to reduce reflection and to improve transmittance within some spectral region.
We provide AR coatings with appropriate materials and optimized configuration on a substrate material specified by the customer, with specified transmittance and a specified wavelength region.
Single Wavelength AR Coatings
Substrate: fused silica, BK7
Surface Figure: < λ/10 @ 632.8nm
Surface Quality: 40-20
Chamfer: 0.5mm, 45°
Coating Material: Electron beam deposited dielectric multi-layers
Incident: 0°
Clear Aperture: > Central 85% of diameter
| Wavelength (nm) | Residual Reflectance |
| 193 | <0.5% |
| 284 | <0.5% |
| 355 | <0.2% |
| 632.8 | <0.2% |
| 670 | <0.2% |
| 780 | <0.2% |
| 808 | <0.2% |
| 980 | <0.2% |
| 1030 | <0.2% |
| 1053 | <0.2% |
| 1064 | <0.2% |
| 1310 | <0.15% |
| 1550 | <0.15% |
Dual Wavelength AR Coatings
Substrate: fused silica, BK7
Surface Figure: <λ/10 @ 632.8nm
Surface Quality: 40-20
Chamfer: 0.5mm, 45°
Coating Material: Electron beam deposited dielectric multi-layers
Incident: 0°
Clear Aperture: > Central 85% of diameter
| Wavelength (nm) | Residual Reflectance |
| 166/532 | 0.5%/0.3% |
| 351/1053 | 0.5%/0.3% |
| 373/745 | 0.5%/0.3% |
| 532/1064 | 0.5%/0.3% |
| 1064/1535 | 0.5%/0.3% |
| 792/2060 | 0.5%/0.3% |
Broadband AR Coatings
Substrate: fused silica, BK7
Surface Figure: <λ/10 @ 632.8nm
Surface Quality: 40-20
Chamfer: 0.5mm, 45°
Coating Material: Electron beam deposited dielectric multi-layers
Incident: 0°
Clear Aperture: > Central 85% of diameter
| Wavelength (nm) | Residual Reflectance |
| 350-650 | <0.5% |
| 420-670 | <0.5% |
| 650-1050 | <0.5% |
| 1050-1550 | <0.5% |
