Introduction
As semiconductor devices continue to shrink and performance requirements intensify, optical technology has become a cornerstone of progress. At the center of this evolution are custom microscope objectives, engineered to meet the unique demands of photolithography, wafer inspection, and metrology. Unlike standard optical systems, custom objectives are tailored to deliver sub-nanometer accuracy, robust thermal stability, and wavelength-specific performance—requirements that are critical to advanced semiconductor manufacturing.
At Shanghai Optics, we specialize in designing and manufacturing these high-precision objectives, helping our partners overcome the challenges of miniaturization, throughput, and environmental constraints.
Applications in Semiconductor Manufacturing
Our custom microscope objectives are integral to several core semiconductor processes:
- Photolithography
We develop high NA objectives optimized for DUV (193nm) and EUV (13.5nm) lithography, enabling feature sizes at 5nm and below. These designs achieve exceptional transmission efficiency, aberration correction, and thermal stability under high-energy light sources.
- Metrology and Inspection
From CD-SEMs to optical defect inspection systems, our objectives deliver improved depth of field and resolution, supporting sub-nanometer defect detection and dimensional measurement. This directly contributes to higher yields and reduced manufacturing variability.
- Laser-Based Semiconductor Processes
For processes like laser annealing and patterning, we provide objectives that precisely control beam shaping, ensuring uniform energy distribution while minimizing thermal damage.
Engineering Considerations in Custom Objective Design
Designing semiconductor-grade microscope objectives requires balancing multiple engineering priorities:
Optical Performance
- High Numerical Aperture (NA): Our objectives routinely achieve NA >0.95 for sub-wavelength resolution.
- Chromatic Correction: We ensure consistent performance across broad spectral ranges, including UV, DUV, and EUV.
- Optimized Field of View (FOV): We carefully design FOV to balance throughput and resolution, often employing aspheric or freeform surfaces.
Material Expertise
We select materials such as fused silica, CaF₂, and ULE glass for their low dispersion, high UV/EUV transmittance, and environmental stability. These choices ensure consistent performance under harsh fab conditions.
Coatings and Surface Treatments
We apply advanced coatings to maximize system performance:
- AR coatings for minimal light loss.
- Hard coatings for long-term durability.
- Custom spectral filters tailored to inspection and metrology requirements.
Overcoming Industry Challenges
Our engineering teams work closely with semiconductor partners to address the industry’s most pressing optical challenges:
- Miniaturization and Complexity
By leveraging freeform optics, adaptive alignment, and state-of-the-art polishing techniques, we achieve nanometer-level tolerances.
- Thermal Stability
Through athermal lens designs and materials engineered for low expansion, we maintain optical performance even under high thermal loads.
- Cost and Scalability
We balance cutting-edge performance with cost efficiency through modular design approaches, collaborative prototyping, and supply chain integration.
- Harsh Environments
Our solutions incorporate vibration isolation, protective coatings, and contamination-control strategies to ensure reliability in semiconductor fabs.
Why Custom Microscope Objectives?
By working with a specialized optical partner, semiconductor manufacturers benefit from:
- Unmatched precision: Sub-nanometer accuracy in alignment and imaging.
- Tailored solutions: Designs optimized for specific wavelengths, geometries, and operating environments.
- Improved yields: Early defect detection and overlay accuracy at advanced nodes.
- Future readiness: Incorporation of meta-lenses, AI-driven design, and eco-conscious materials.
Looking Ahead: The Future of Custom Objectives
The semiconductor industry’s roadmap demands continuous innovation. Our research and development focuses on emerging areas such as:
- Meta-lens integration for ultra-thin, high-performance systems.
- AI-assisted design optimization for faster, more efficient development cycles.
- Sustainable optics designed with energy efficiency and eco-friendly materials.
By combining decades of optical expertise with advanced manufacturing, Shanghai Optics delivers the custom microscope objectives that drive next-generation semiconductor technologies.
Conclusion
Custom microscope objectives are more than just components—they are enablers of innovation in semiconductor manufacturing. At Shanghai Optics, we bring together engineering precision, material science, and advanced fabrication to design objectives that meet the most demanding requirements of the semiconductor industry. Whether for photolithography, metrology, or inspection, our solutions empower semiconductor manufacturers to push the boundaries of what’s possible.
